- PTCXPUMP High Pressure Pumps are also commonly referred to in the industry as dual-shaft pumps, dual-output shaft high-pressure pumps, dual-bearing high-pressure pumps, or twin-screw high-pressure pumps.
- Powered by compressed air, this pumping device pressurizes and discharges liquids through two synchronized or alternating shafts (plungers). It elevates low-pressure fluids to extremely high pressures, enabling atomization or precise-metering spraying through specialized nozzles.
- The core of the dual-shaft pneumatic high-pressure pump lies in its advanced "dual-reciprocating motion" mechanism.
- Delivers exceptional pressure output stability. While single-shaft pumps generate noticeable pressure pulsations during stroke reversals, the dual-shaft design utilizes an alternating pressure-compensation mechanism to provide a near-linear, stable output—which is absolutely critical for enhancing wafer cleaning uniformity. Engineered with a critical fail-safe design logic; even if one set of seals experiences minor
- wear or leakage, the other shaft can maintain baseline pressure. This prevents immediate production line shutdowns and wins crucial buffer time for scheduled maintenance.
- Operating entirely without electrical power, it achieves intrinsic safety and can be installed directly in chemical storage tank areas or flammable gas environments, eliminating the need for expensive explosion-proof enclosures.
- The dual-shaft structure effectively shares the reciprocating frequency of a single shaft, slowing down the wear rate of the seals and significantly extending the Mean Time Between Failures (MTBF). This offers immense market appeal for factories striving for 24/7 continuous operations.
- Feature
- Application
- Industries
- Maximum Discharge Pressure: 2,400 PSI (34:1 Pressure Ratio) / 3,500 PSI (50:1 Pressure Ratio).
- Highly Stable Pressure Output: Fluctuations and pulsation rates are kept strictly below 5%.
- High Cleanliness Standards: Guarantees zero oil residue and exceptionally low particle leaching/extraction.
- Pneumatic Design: Driven by compressed air to pressurize cleaning liquids (e.g., Ultra-Pure Water, photoresist), offering superior explosion-proof safety.
- Purely Air-Driven Core: Requires no electrical power supply, completely eliminating the risk of explosions triggered by electrical sparks or arcing from the root.
- Consistent & Stable Pressure Output: Driven by an internal pneumatic distribution valve, the dual shafts alternate operations to effectively suppress fluid pulsation, ensuring a stable flow rate throughout the pressurization process.
- Dual-Defensive Mechanism: Features a dual-set seal design; even if one set experiences minor wear, the redundancy backup mechanism immediately takes over to ensure continuous production line operation.
- Low Maintenance Costs: The dual-shaft structure effectively shares the reciprocating frequency of a single shaft, slowing down seal wear and significantly extending the Mean Time Between Failures (MTBF).
- Horizontal Configuration & Easy Installation: Adopts a horizontal setup for effortless installation and direct piping, drastically minimizing the risk of fluid leakage at joint threads.
- Check Valve Seal Structure: Constructed from high-grade fluoropolymer (PTFE).
Engineered for Rigorous Environments Demanding "High-Pressure Stable Output" and "Strict Safety Standards": PTCXPUMP High-Pressure Pumps Are Highly Recommended
Semiconductor Front-End Processes (Single-Wafer & Photolithography Cleaning)
Specifically engineered for single-wafer processing and photolithography cleaning systems, satisfying the most stringent contamination requirements for microparticles on wafer surfaces. Leveraging a sub-5% stable output pressure fluctuation and a high-cleanliness structure, it delivers precise and consistent chemical delivery to reliably remove surface contaminants from silicon wafers—serving as a critical key to boosting yields in fine-patterning geometries.
Etch & Advanced Packaging Clean (Etching & Bumping Processes)
Demonstrates superior fluid control in etching post-clean and bumping processes. Whether handling highly corrosive etching chemistries or aggressive organic solvents required prior to bumping sputtering (such as acetone and isopropyl alcohol/IPA), the dual-shaft redundancy mechanism ensures uninterrupted, stable pressurized output under high-intensity ultrasonic and specialized cleaning environments.
Fine Chemicals & Chemical Delivery Systems (Fine Chemicals & CDS)
Featuring excellent pneumatic explosion-proof safety, this pump is the ideal choice for chemical delivery systems (CDS) and circulation loops involving high-purity, electronic-grade chemicals, strong acids, and strong bases. Within hazardous explosion-proof zones where the risk of electrical sparks is completely eliminated, it safely and seamlessly pressurizes high-risk fluids while ensuring absolute production-line safety.
Industrial Cleaning & Surface Treatment (Precision Component & Panel Cleaning)
Tailored for high-end industrial sectors, precision components, or optoelectronic panel surface-cleaning needs, providing a powerful high-pressure output of up to 3,500 PSI. The combination of high-cleanliness control (zero oil residue, low particle leaching) and the extended Mean Time Between Failures (MTBF) of the dual-shaft architecture enables efficient stripping of stubborn contaminants in continuous automated cleaning lines without damaging the workpiece surface.
- Semiconductor & Optoelectronics
- Wafer Wet Cleaning
- Single Wafer & Photo Clean
- Stripping & Etching Clean
- Advanced Packaging Bumping Clean
- Fine Chemicals & CDS
- Chemical Delivery System Dispensing
- Pressurizing Corrosive Fluids
- Fluid Transfer in Explosion-Proof Zones
- Energy & Power Systems
- Fuel Cell Humidification
- Continuous Chemical Feeding
- Boiler Water Treatment
- Industrial Cleaning & Surface Treatment
- Precision Parts & Panel Degreasing
- PCB & Equipment High-Pressure Rinsing
